The Electron Microscope Facility of the Department of Materials at the University of Oxford is one of the largest in the world. It has 9 TEM instruments, 6 SEM microscopes and 2 microprobes, together with a wide range of sample preparation equipment.
The microscopy computing laboratory provides modern hardware and software to conduct up to date research in microscopy simulations and image processing.


The OXFEM group has special expertise in high resolution transmission electron microscopy and in-situ electron microscopy. It also has a long tradition in development of innovative accessories for microscopy and detectors.


The OXFEM laboratory provides access to the following transmission electron microscopes: Jeol 2200FS, Jeol 3000F, Jeol 4000EX, Jeol 4000EX SE. A FEI FIB 200 instrument is operating, particularly for sample preparation.



  • JEOL JEM-2000F
  • JEOL JEM-2010




This next generation FEG-TEM is fitted with a Cs abberation corrector to minimize to probe-size and maximize the spatial resolution of hte image and spectroscopic data. It is equipped with state-of-the-art XEDS and EELS systems. It also has a novel in-line omega-filter to allow energy filtering of images and diffraction patterns. This instrument has full remote access capability allowing it to be used by operators from remote sites via the Internet2 system.







This FEG analytical resolution microscope (2002) equipped with FASTEM software combines high resolution imaging (0.191 nm at Scherzer, 0.135 nm information limit) with several analytical tools including an Inca EDX system and a GIF2000 post column electron energy-loss spectrometer. The STEM unit operating with a HAADF detector has a resolution of 0.136 nm. A minimum probe size of 0.38 nm in diameter can be obtained for spot analysis. The computer controlled goniometer is equipped with an anti-drift piëzostage and heating and cooling experiments can be performed







This instrument (1988) has a structure image resolving power of 0.17 nm and as such the performance available for structure imaging on an atomic scale. It is equipped with a top-entry goniometer stage allowing tilt angles of 20° (in two opposite directions) and with an imaging system allowing direct magnifications of 20.000.000 times.

The JEOL 4000EX is a 400kV dedicated high resolution TEM with a LaB6 source, This instrument has an objective lens polepiece designed specifically for optimum HREM performance. The top entry stage results in excellent sample stability over long periods. Tilts of up to ± 25° can be achieved in a polepiece that has a very narrow gap and hence a low spherical aberration coefficient of 0.9 mm. This results in a high point-to-point resolution of 0.17nm (information limit 0.135nm). The 4000-EX II is used almost exclusively for high resolution TEM, and as such is used to acquire focal/tilt series for the reconstruction of atomic structure.



  • JEOL JEM-4000SE
  • Philips CM20


  • VG HB501


  • CyberSEM
  • Hitachi S530
  • JEOL JSM-6300
  • JEOL JSM-6480V
  • JEOL JSM-840A
  • JEOL JSM-840F


  • Computing facilities
  • FIB




Focused Ion Beam (FIB) systems utilize a finely focused beam of gallium ions operated at low-beam currents for imaging and at high-beam currents for site-specific milling. Their versatility makes them popular for a wide variety of applications including advanced circuit edit, and revealing below-the-surface defects in advanced materials and devices.

  • Specimen preparation