The EMAT research group of the University of Antwerp has special experience in HREM, both experimental and theoretical, EELS and application of TEM to nanotechnological problems. Within the group there is a strong collaboration with solid state physicists for theoretical support. The necessary hardware and software for image interpretation and image processing are present. A supercluster of 256 dual Opteron processors can be used to support the interpretations.
EMAT offers access to the following transmission electron microscopes:
- High resolution instruments JEOL-3000F, JEOL 4000EX and Philips CM30,
- Analytical microscope Philips CM20,
- High voltage microscope JEOL 1250.
- A FIB instrument mainly dedicated to complex sample preparation.
This FEG analytical resolution microscope (2002) equipped with FASTEM software combines high resolution imaging (0.191 nm at Scherzer, 0.135 nm information limit) with several analytical tools including an Inca EDX system and a GIF2000 post column electron energy-loss spectrometer. The STEM unit operating with a HAADF detector has a resolution of 0.136 nm. A minimum probe size of 0.38 nm in diameter can be obtained for spot analysis. The computer controlled goniometer is equipped with an anti-drift piëzostage and heating and cooling experiments can be performed
This instrument (1988) has a structure image resolving power of 0.17 nm and as such the performance available for structure imaging on an atomic scale. It is equipped with a top-entry goniometer stage allowing tilt angles of 20° (in two opposite directions) and with an imaging system allowing direct magnifications of 20.000.000 times.
This microscope was constructed in the framework of a Brite-Euram project (1990-1994) sponsored by the European Community. The instrument is fully equipped for direct reconstruction of the structure of the object under investigation, either by electron holography or by the technique of focus variation, which has been proposed and developed in the EMAT group. For this purpose this microscope, which was installed in Antwerp at the end of 1994, is equipped with a field emission source for brightness and coherence, a CCD camera for detecting single electrons, a Mollenstedt biprism and a powerful on line image processing system (80 MFLOPS) with computer control of all the imaging parameters. The alignment of the microscope and the direct retrieval is fully automated and result in a point-to-point resolution of 0.10 nm.
In addition the microscope is equipped with a post-column GIF200 system for energy-loss spectroscopy and energy filtered imaging.
This versatile microscope (1991) combines good resolution (0.27 nm) with a range of analytical capabilities such as nanometer scale X-ray microanalysis, nanoprobe microdiffraction and convergent beam electron diffraction. Areas below 10 nm in size can be analysed for their composing elements and structure characteristics. High stability double tilt heating and cooling holders as well as a room temperature straining holder are available.
Dedicated small scanning electron microscope (2003) with a resolution of 3.5 nm and equipped with an Inca X-ray microanalysis unit enabling surface morphology studies and identification of the elements present at the surface of conducting materials. Non-conducting materials require a coating with gold or carbon for optimal imaging.
The Nova 200 NanoLab is a versatile, high-performance DualBeam system containing a Ga+ focused ion beam (FIB) together with a scanning electron microscope (SEM). This allows selective etching of materials while imaging the process and the area of interest at the same time. In addition the system is equipped with a Pt deposition source and an Omniprobe for micro manipulation of the specimen. The main purpose of the Nova 200 is site-specific specimen preparation with ex-situ or in-situ liftout.